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Suzhou Maxwell Technologies Co., Ltd.
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PVD Coating Equipment_Maxwell P6K
A set of horizontal on-line magnetron sputtering continuous coating.
Equipment Advantages
  • 01
    Large Capacity(17280pcs@ half-size G12, 720mw for single equipment)
  • 02
    Tray design with high tray utilization, low thermal expansion coefficient and high flatness specially for PVD coating of HJT cell
  • 03
    Design of PVD chamber structure with high productivity and low debris rate for HJT cell
  • 04
    PVD cathode structure design of high magnetism, low temperature and high sputtering rate
  • 05
    Design of fast and uniform heating unit；Design of PVD cathode chamber with good uniformity
  • 06
    High-quality TCO film coating technology with short CT for PVD online
Equipment Picture
PVD Coating Equipment_Maxwell P6K
Basic Parameters
  • 1. Throughput(pcs/hour) and Wafer Size*: 17280pcs@G12, half-cell; 19400pcs@G12R, half-cell