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Suzhou Maxwell Technologies Co., Ltd.
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PECVD Coating Equipment_MV-LH06K
A set of inline quasi dynamic PECVD coating equipment, depositing I layer & nanocrystalline silicon film on front & backside of wafer.
Equipment Advantages
  • 01
    Inline multi chamber quasi dynamic PECVD coating technique
  • 02
    Layered high quality nanocrystalline silicon passivation coating technology
  • 03
    PECVD multilayer showerhead discharge cathode design
  • 04
    Composite tray design with large size, light load, low thermal expansion coefficient and high flatness
  • 05
    Inline corrosion resistant magnetic fluid & vacuum transfer for large size tray
  • 06
    RF rapid ignition setup and real-time plasma glow observation position
Equipment Picture
PECVD Coating Equipment_MV-LH06K
Basic Parameters
  • 1. Throughput(pcs/hour) and Wafer Size*: 17280pcs@G12, half-cell; 19400pcs@G12R, half-cell